EFFECT OF THE ANALYZER ACCEPTANCE ANGLE ON THE PHOTOELECTRON INTENSITY

被引：16

作者：

JABLONSKI, A ^{[1
]}

EBEL, MF ^{[1
]}

EBEL, H ^{[1
]}

机构：

[1] VIENNA TECH UNIV,INST ANGEW & TECH PHYS,A-1040 VIENNA,AUSTRIA

来源：

JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA | 1987年 / 42卷 / 03期

关键词：

D O I：

10.1016/0368-2048(87)80034-8

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

引用

页码：235 / 243

页数：9

共 12 条

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[5] THE INFLUENCE OF ELASTIC-SCATTERING OF ELECTRONS ON MEASURED X-RAY PHOTOELECTRON SIGNALS [J].

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JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1984, 34 (04) :355-362

[6] ON THE INFLUENCE OF ELASTIC-SCATTERING ON ASYMMETRIC XP-SIGNAL DISTRIBUTION [J].

EBEL, H ;

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[7] QUANTITATIVE XPS ANALYSIS CONSIDERING ELASTIC-SCATTERING [J].

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[8] SURFACE ANALYSIS AND ANGULAR-DISTRIBUTIONS IN X-RAY PHOTOELECTRON-SPECTROSCOPY [J].

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[9] THEORETICAL REMARKS CONCERNING EXPERIMENTAL DETERMINATION OF PHOTOELECTRON ASYMMETRY PARAMETER -BETA [J].

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[10]

JABLONSKI A, 1986, J ELECTRON SPECTROSC, V40, P125, DOI 10.1016/0368-2048(86)80013-5

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