EFFECTS OF PROCESSING ON CHARACTERISTICS OF 10-15 NM THERMALLY GROWN SIO2-FILMS

被引：14

作者：

PAN, PH

SCHAEFER, C

机构：

[1] IBM, Essex Junction, VT, USA, IBM, Essex Junction, VT, USA

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1986年 / 133卷 / 06期

关键词：

D O I：

10.1149/1.2108813

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

27

引用

收藏

页码：1171 / 1176

页数：6

相关论文

共 27 条

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