ELECTRON-BEAM SYSTEM FOR RAPID ISOTHERMAL ANNEALING OF SEMICONDUCTOR-MATERIALS AND DEVICES

被引：24

作者：

MCMAHON, RA

HASKO, DG

AHMED, H

机构：

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 1985年 / 56卷 / 06期

关键词：

D O I：

10.1063/1.1137987

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：1257 / 1261

页数：5

共 19 条

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