DIAGNOSTIC ON N-2 PLASMA WITH AN ENERGY-RESOLVED QUADRUPOLE MASS-SPECTROMETER AT THE POWERED ELECTRODE IN A REACTIVE ION ETCHING SYSTEM - ION ENERGY-DISTRIBUTION OF N-2(+) AND N+

被引:12
作者
BECKER, F
RANGELOW, IW
MASSELI, K
KASSING, R
机构
[1] Institute of Technical Physics, University of Kassel, D-34132 Kassel
关键词
NITROGEN PLASMA; ION ENERGY DISTRIBUTION; ENERGY RESOLVED MASS SPECTROMETRY;
D O I
10.1016/0257-8972(95)08251-4
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
An energy-resolved quadrupole mass spectrometer (E-QMS) was assembled underneath the powered electrode of a diode reactive ion etcher. The plasma ions reach the QMS through an orifice in the powered electrode with a diameter of 100 mu m. The ion energy distributions (IEDs) of N-2(+) and N+ from N-2 plasmas in the pressure range 0.1-2 Pa for d.c. bias potentials between 50 V and 350 V and a frequency of 13.56 MHz were investigated. The IEDs of N-2(+) and N+ always show a saddle-shaped peak at an energy corresponding to the total potential drop across the sheath given by U-DC + U-PI, where U-DC is the d.c. bias potential and U-PI is the time averaged plasma potential. In the energy range from OeV to eU(DC) there are multiple peaks in the IEDs of N-2(+) owing to symmetric resonant charge transfer collisions, whereas the N+ shows only a broad distribution. Thus we conclude that the collision processes of N+ are predominantely elastic. With increasing pressure, the intensity of the peaks in the IEDs of N-2(+) below eU(DC) exceeds the intensity of the saddle-shaped peaks at U-DC + U-PI owing to a higher probability for charge transfer collisions in the sheath. The intensity of the broad distribution in the IEDs of NC also increases with increasing pressure, but never exceeds the intensity of the saddle-shaped peak.
引用
收藏
页码:485 / 490
页数:6
相关论文
共 32 条
[1]   ANOMALIES OF ENERGY OF POSITIVE IONS EXTRACTED FROM HIGH-FREQUENCY ION SOURCES . A THEORETICAL STUDY [J].
BENOITCATTIN, P ;
BERNARD, LC .
JOURNAL OF APPLIED PHYSICS, 1968, 39 (12) :5723-+
[2]  
BIEHLER S, 1991, THESIS RUHR U BOCHUM
[3]   ION-ASSISTED AND ELECTRON-ASSISTED GAS-SURFACE CHEMISTRY - IMPORTANT EFFECT IN PLASMA-ETCHING [J].
COBURN, JW ;
WINTERS, HF .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (05) :3189-3196
[4]   ION ENERGY-DISTRIBUTIONS IN RADIOFREQUENCY DISCHARGES [J].
FIELD, D ;
KLEMPERER, DF ;
MAY, PW ;
SONG, YP .
JOURNAL OF APPLIED PHYSICS, 1991, 70 (01) :82-92
[5]   ION DISTRIBUTION-FUNCTIONS BEHIND AN RF SHEATH [J].
FLENDER, U ;
WIESEMANN, K .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1994, 27 (03) :509-521
[6]  
GHOSH PK, 1991, 10TH P INT S PLASM C, V2
[7]   ION TRANSIT THROUGH CAPACITIVELY COUPLED AR SHEATHS - ION CURRENT AND ENERGY-DISTRIBUTION [J].
GREENE, WM ;
HARTNEY, MA ;
OLDHAM, WG ;
HESS, DW .
JOURNAL OF APPLIED PHYSICS, 1988, 63 (05) :1367-1371
[8]   ION ENERGY-DISTRIBUTIONS IN SICL4 AND AR/O2 DRY ETCHING DISCHARGES [J].
HOPE, DAO ;
MONNINGTON, GJ ;
GILL, SS ;
BORSING, N ;
SMITH, JA ;
REES, JA .
VACUUM, 1993, 44 (3-4) :245-248
[9]   ION AND ELECTRON-ENERGY ANALYSIS AT A SURFACE IN AN RF DISCHARGE [J].
INGRAM, SG ;
BRAITHWAITE, NSJ .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1988, 21 (10) :1496-1503
[10]   RF MODULATION OF POSITIVE-ION ENERGIES IN LOW-PRESSURE DISCHARGES [J].
INGRAM, SG ;
BRAITHWAITE, NS .
JOURNAL OF APPLIED PHYSICS, 1990, 68 (11) :5519-5527