CHEMICAL IMPLANTATION OF 10-KEV H+ AND D+ IN RUTILE

被引：29

作者：

SISKIND, B ^{[1
]}

GRUEN, DM ^{[1
]}

VARMA, R ^{[1
]}

机构：

[1] ARGONNE NATL LAB,ARGONNE,IL 60439

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1977年 / 14卷 / 01期

关键词：

D O I：

10.1116/1.569302

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：537 / 542

页数：6

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