PHOTODEPOSITION RATES OF METAL FROM METAL ALKYLS

被引：33

作者：

KRCHNAVEK, RR ^{[1
]}

GILGEN, HH ^{[1
]}

CHEN, JC ^{[1
]}

SHAW, PS ^{[1
]}

LICATA, TJ ^{[1
]}

OSGOOD, RM ^{[1
]}

机构：

[1] COLUMBIA UNIV,MICROELECTR SCI LABS,NEW YORK,NY 10027

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 01期

关键词：

D O I：

10.1116/1.583866

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：20 / 26

页数：7

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