ELLIPSOMETRIC MEASUREMENTS OF MOLECULAR-BEAM-EPITAXY-GROWN SEMICONDUCTOR MULTILAYER THICKNESSES - A COMPARATIVE-STUDY

被引：30

作者：

WOOLLAM, JA ^{[1
]}

SNYDER, PG ^{[1
]}

MCCORMICK, AW ^{[1
]}

RAI, AK ^{[1
]}

INGRAM, D ^{[1
]}

PRONKO, PP ^{[1
]}

机构：

[1] UNIVERSAL ENERGY SYST,DAYTON,OH 45432

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 12期

关键词：

D O I：

10.1063/1.338992

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4867 / 4871

页数：5

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