LTMBE GAAS - PRESENT STATUS AND PERSPECTIVES

被引:42
作者
WITT, GL
机构
[1] AFOSR/NE, Bolling AFB
来源
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 1993年 / 22卷 / 01期
关键词
D O I
10.1016/0921-5107(93)90215-9
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
When GaAs is grown via MBE at 200 degrees C (compared to the normal 580-600 degrees C), the films manifest a remarkable set of structural, electrical and optical properties. As grown, LT GaAs (as it is commonly known) has an excess of As, contains a high concentration of point defects, displays hopping band conductivity and shows little, if any, photoluminescence. After a 600 degrees C anneal, the layers have a relaxed lattice constant, are highly resistive and contain a distribution of As precipitates. The point defect concentration diminishes by several orders of magnitude. The photo-induced carrier lifetime typically is of the order of 200 fs. This account will review what is known about these interesting materials, discuss models to explain the transport properties and mention potential applications.
引用
收藏
页码:9 / 15
页数:7
相关论文
共 26 条
[21]   GROWTH-PARAMETER DEPENDENCE OF DEEP LEVELS IN MOLECULAR-BEAM-EPITAXIAL GAAS [J].
STALL, RA ;
WOOD, CEC ;
KIRCHNER, PD ;
EASTMAN, LF .
ELECTRONICS LETTERS, 1980, 16 (05) :171-172
[22]   SUBPICOSECOND, FREELY PROPAGATING ELECTROMAGNETIC PULSE GENERATION AND DETECTION USING GAAS-AS EPILAYERS [J].
WARREN, AC ;
KATZENELLENBOGEN, N ;
GRISCHKOWSKY, D ;
WOODALL, JM ;
MELLOCH, MR ;
OTSUKA, N .
APPLIED PHYSICS LETTERS, 1991, 58 (14) :1512-1514
[23]   ARSENIC PRECIPITATES AND THE SEMI-INSULATING PROPERTIES OF GAAS BUFFER LAYERS GROWN BY LOW-TEMPERATURE MOLECULAR-BEAM EPITAXY [J].
WARREN, AC ;
WOODALL, JM ;
FREEOUF, JL ;
GRISCHKOWSKY, D ;
MCINTURFF, DT ;
MELLOCH, MR ;
OTSUKA, N .
APPLIED PHYSICS LETTERS, 1990, 57 (13) :1331-1333
[24]   OPTOELECTRONIC APPLICATIONS OF LTMBE III-V MATERIALS [J].
WHITAKER, JF .
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1993, 22 (01) :61-67
[25]   IMPROVED BREAKDOWN VOLTAGE IN GAAS-MESFETS UTILIZING SURFACE-LAYERS OF GAAS GROWN AT A LOW-TEMPERATURE BY MBE [J].
YIN, LW ;
HWANG, Y ;
LEE, JH ;
KOLBAS, RM ;
TREW, RJ ;
MISHRA, UK .
IEEE ELECTRON DEVICE LETTERS, 1990, 11 (12) :561-563
[26]  
YIN LW, IN PRESS J ELECTRON