LIFETIME DEGRADATION IN SILICON BY EMITTER DIFFUSION

被引:1
作者
GHOSHTAGORE, RN [1 ]
机构
[1] WESTINGHOUSE ELECT CORP,SERV,PITTSBURGH,PA 15235
关键词
D O I
10.1149/1.2133673
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
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页码:1449 / 1451
页数:3
相关论文
共 3 条
[1]   CORRELATIONS BETWEEN REVERSE RECOVERY TIME AND LIFETIME OF P-N JUNCTION DRIVEN BY A CURRENT RAMP [J].
KAO, YC ;
DAVIS, JR .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1970, ED17 (09) :652-&
[2]   KINETICS OF PHOSPHORUS PREDEPOSITION IN SILICON USING POCL3 [J].
NEGRINI, P ;
NOBILI, D ;
SOLMI, S .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (09) :1254-1260
[3]   EXPERIMENTS ON ORIGIN OF PROCESS-INDUCED RECOMBINATION CENTERS IN SILICON [J].
SAH, CT ;
WANG, CT .
JOURNAL OF APPLIED PHYSICS, 1975, 46 (04) :1767-1776