TEMPERATURE CHANGES IN THIN FILMS DURING GROWTH BY PHYSICAL VAPOR DEPOSITION .2. EXPERIMENTAL

被引：6

作者：

THORNBURG, DD

WAYMAN, CM

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1971年 / 42卷 / 10期

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D O I：

10.1063/1.1659726

中图分类号：

O59 [应用物理学];

学科分类号：

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页码：4071 / +

页数：1

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[7] TEMPERATURE CHANGES IN THIN FILMS DURING GROWTH BY PHYSICAL VAPOR DEPOSITION .1. THEORETICAL
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[J]. JOURNAL OF APPLIED PHYSICS, 1971, 42 (10) : 4063 - +
[8] THORNBURG DD, 1971, THESIS U ILLINOIS