HIGH-PERFORMANCE A-SIGE SOLAR-CELLS USING A SUPER CHAMBER METHOD

被引:5
作者
HAKU, H
SAYAMA, K
MARUYAMA, E
DOHJOH, H
NAKAMURA, N
TSUDA, S
NAKANO, S
KISHI, Y
KUWANO, Y
机构
[1] Functional Materials Research Center, SANYO Electric Co. Ltd, Hirakata, Osaka, 573
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1991年 / 30卷 / 11A期
关键词
A-SIGE; SOLAR CELL; ULTRAHIGH VACUUM; IMPURITY; STM;
D O I
10.1143/JJAP.30.2700
中图分类号
O59 [应用物理学];
学科分类号
摘要
The influence of impurities on the a-SiGe film properties was investigated using a super chamber. It was found that a-SiGe films with a low impurity concentration can maintain a high photosensitivity of about 10(6) for Ge content up to 13%, and impurity incorporation deteriorates film rigidity, which was first deduced from the STM (scanning tunneling microscope) measurement. Using a super chamber method, the highest conversion efficiency of 3.34% was obtained for an a-SiGe single-junction cell under red light (long-wavelength light (> approximately 650 nm) by filtering AM-1.5, 100 mW/cm2 light). A conversion efficiency of 11.9% was also achieved for a stacked cell of a-Si/a-Si/a-SiGe.
引用
收藏
页码:2700 / 2704
页数:5
相关论文
共 10 条
[1]   PREPARATION AND PROPERTIES OF A-SIGE-H FILMS FABRICATED WITH A SUPER CHAMBER (SEPARATED ULTRAHIGH-VACUUM REACTION CHAMBER) [J].
HAKU, H ;
SAYAMA, K ;
NAKASHIMA, Y ;
TAKAHAMA, T ;
ISOMURA, M ;
TARUI, H ;
HISHIKAWA, Y ;
TSUDA, S ;
NAKANO, S ;
OHNISHI, M ;
KUWANO, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1987, 26 (12) :1978-1982
[2]  
HISHIKAWA Y, 1989, 9TH P EC PHOT SOL EN, P37
[3]   GUIDING PRINCIPLE IN THE PREPARATION OF HIGH-PHOTOSENSITIVE HYDROGENATED AMORPHOUS SI-GE ALLOYS FROM GLOW-DISCHARGE PLASMA [J].
MATSUDA, A ;
KOYAMA, M ;
IKUCHI, N ;
IMANISHI, Y ;
TANAKA, K .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1986, 25 (01) :L54-L56
[4]  
MENNA P, 1987, 19TH P IEEE PHOT SPE, P832
[5]  
OHNISHI M, 1991, IN PRESS MATER RES S
[6]  
SATO M, 1989, 9TH P EC PHOT SOL EN, P271
[7]   HIGH-QUALITY P-TYPE A SIC FILMS OBTAINED BY USING A NEW DOPING GAS OF B(CH3)3 [J].
TARUI, H ;
MATSUYAMA, T ;
OKAMOTO, S ;
DOHJOH, H ;
HISHIKAWA, Y ;
NAKAMURA, N ;
TSUDA, S ;
NAKANO, S ;
OHNISHI, M ;
KUWANO, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1989, 28 (12) :2436-2440
[8]   PREPARATION AND PROPERTIES OF HIGH-QUALITY A-SI FILMS WITH A SUPER CHAMBER (SEPARATED ULTRAHIGH-VACUUM REACTION CHAMBER) [J].
TSUDA, S ;
TAKAHAMA, T ;
ISOMURA, M ;
TARUI, H ;
NAKASHIMA, Y ;
HISHIKAWA, Y ;
NAKAMURA, N ;
MATSUOKA, T ;
NISHIWAKI, H ;
NAKANO, S ;
OHNISHI, M ;
KUWANO, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1987, 26 (01) :33-38
[9]  
TSUGE S, 1990, 1990 INT PHOT SCI EN, V5, P261
[10]  
ZEMAN M, 1990, 1990 INT PHOT SCI EN, V5, P43