STRUCTURE AND STABILITY OF SPUTTER-DEPOSITED BETA-TUNGSTEN THIN-FILMS

被引:110
作者
WEERASEKERA, IA
SHAH, SI
BAXTER, DV
UNRUH, KM
机构
[1] INDIANA UNIV,DEPT PHYS,BLOOMINGTON,IN 47405
[2] DUPONT CO INC,CENT RES & DEV,EXPT STN,WILMINGTON,DE 19898
关键词
D O I
10.1063/1.111318
中图分类号
O59 [应用物理学];
学科分类号
摘要
The structure and stability of thin tungsten films prepared by radio frequency magnetron sputter deposition have been studied by x-ray diffraction and x-ray photoelectron spectroscopy. The structure of these films has been found to systematically evolve from the metastable A 15 beta-W phase to the equilibrium A2 alpha-W phase with decreasing oxygen impurity concentration. Within the beta-W phase a decrease in the concentration of incorporated oxygen results in a monotonic decrease in the lattice parameter of the unit cell until the beta-W phase eventually becomes unstable, and the alpha-W phase is formed.
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页码:3231 / 3233
页数:3
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