PHASES OBSERVED IN OXYGEN-REACTIVE SPUTTERING OF TANTALUM

被引：7

作者：

FEINSTEIN, LG

机构：

来源：

APPLIED PHYSICS LETTERS | 1971年 / 19卷 / 05期

关键词：

D O I：

10.1063/1.1653857

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：137 / +

页数：1

共 10 条

[1] RF SPUTTERED TANTALUM FILMS DEPOSITED IN AN OXYGEN DOPED ATMOSPHERE [J].

BAKER, PN .

THIN SOLID FILMS, 1970, 6 (05) :R57-&

[2] OXIDE DER TIEFTEMPERATUROXYDATION VON NIOB UND TANTAL [J].

BRAUER, G ;

MULLER, H ;

KUHNER, G .

JOURNAL OF THE LESS-COMMON METALS, 1962, 4 (06) :533-546

[3]

FEINSTEIN LG, UNPUBLISHED RESULTS

[4] PHASE FORMING PROCESSES IN TANTALUM FILMS THROUGH SPUTTERING [J].

NAKAMURA, M ;

FUJIMORI, M ;

NISHIMURA, Y .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1970, 9 (05) :557-+

[5] METALLIC OXIDE PHASES OF NIOBIUM AND TANTALUM .1. X-RAY INVESTIGATIONS [J].

NORMAN, N .

JOURNAL OF THE LESS-COMMON METALS, 1962, 4 (01) :52-61

[6] A NEW STRUCTURE IN TANTALUM THIN FILMS (VAPOR DEPOSITION SUPERCONDUCTIVITY SPUTTERING X-RAY DIFFRACTION E) [J].

READ, MH ;

ALTMAN, C .

APPLIED PHYSICS LETTERS, 1965, 7 (03) :51-&

[7]

READ MH, UNPUBLISHED

[8] EFFECT OF BACKGROUND-GAS IMPURITIES ON FORMATION OF SPUTTERED BETA-TANTALUM FILMS [J].

SOSNIAK, J ;

POLITO, WJ ;

ROZGONYI, GA .

JOURNAL OF APPLIED PHYSICS, 1967, 38 (08) :3041-&

[9] PHASE COMPOSITION AND CONDUCTIVITY OF SPUTTERED TANTALUM [J].

WESTWOOD, WD ;

LIVERMORE, FC .

THIN SOLID FILMS, 1970, 5 (5-6) :407-+

[10] ORIENTATION EFFECTS IN RESISTIVITY OF TA FILMS SPUTTERED IN OXYGEN [J].

WESTWOOD, WD .

APPLIED PHYSICS LETTERS, 1970, 17 (06) :264-&

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