UNUSUAL ROOM-TEMPERATURE INTERMIXING AND OXIDATION IN COPPER DEPOSITED ON A FLUORINATED AMORPHOUS-SILICON SYSTEM

被引：10

作者：

CYTERMANN, C ^{[1
]}

BRENER, R ^{[1
]}

SACHER, E ^{[1
]}

PRATT, B ^{[1
]}

WEIL, R ^{[1
]}

机构：

[1] TECHNION ISRAEL INST TECHNOL,DEPT PHYS,IL-32000 HAIFA,ISRAEL

来源：

关键词：

D O I：

10.1063/1.99516

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：191 / 193

页数：3

共 25 条

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