THERMAL-OXIDATION OF SILICIDES ON SILICON

[1] INTERACTION OF OXYGEN WITH SILICON D-METAL INTERFACES - A PHOTOEMISSION INVESTIGATION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (02): : 409 - 412

[2] ADDA Y, 1966, DIFFUSION SOLIDES, P52

[3] ALTERNATIVE MARKER EXPERIMENT IN FORMATION OF MO AND W SILICIDES [J]. APPLIED PHYSICS LETTERS, 1978, 33 (04) : 289 - 290

[4] INTERFACE-MARKER TECHNIQUE APPLIED TO THE STUDY OF METAL SILICIDE GROWTH [J]. NUCLEAR INSTRUMENTS & METHODS, 1980, 168 (1-3): : 491 - 497

[5] INTERFACE EFFECTS IN THE FORMATION OF SILICON-OXIDE ON METAL SILICIDE LAYERS OVER SILICON SUBSTRATES [J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (04) : 1849 - 1854

[6] THERMAL-OXIDATION OF TRANSITION-METAL SILICIDES - THE ROLE OF MASS-TRANSPORT [J]. THIN SOLID FILMS, 1983, 107 (01) : 55 - 65

[7] THERMAL-OXIDATION OF NICKEL DISILICIDE [J]. APPLIED PHYSICS LETTERS, 1982, 40 (02) : 175 - 177

[8] THERMAL-OXIDATION OF TRANSITION-METAL SILICIDES ON SI - SUMMARY [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (02) : 371 - 375

[9] MARKER EXPERIMENTS FOR DIFFUSION IN THE SILICIDE DURING OXIDATION OF PDSI, PD2SI, COSI2, AND NISI2 FILMS ON [SI] [J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (09) : 5404 - 5405

[10] BAUER RS, 1983, SURFACES INTERFACES

[1] INTERACTION OF OXYGEN WITH SILICON D-METAL INTERFACES - A PHOTOEMISSION INVESTIGATION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (02): : 409 - 412

[2] ADDA Y, 1966, DIFFUSION SOLIDES, P52

[3] ALTERNATIVE MARKER EXPERIMENT IN FORMATION OF MO AND W SILICIDES [J]. APPLIED PHYSICS LETTERS, 1978, 33 (04) : 289 - 290

[4] INTERFACE-MARKER TECHNIQUE APPLIED TO THE STUDY OF METAL SILICIDE GROWTH [J]. NUCLEAR INSTRUMENTS & METHODS, 1980, 168 (1-3): : 491 - 497

[5] INTERFACE EFFECTS IN THE FORMATION OF SILICON-OXIDE ON METAL SILICIDE LAYERS OVER SILICON SUBSTRATES [J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (04) : 1849 - 1854

[6] THERMAL-OXIDATION OF TRANSITION-METAL SILICIDES - THE ROLE OF MASS-TRANSPORT [J]. THIN SOLID FILMS, 1983, 107 (01) : 55 - 65

[7] THERMAL-OXIDATION OF NICKEL DISILICIDE [J]. APPLIED PHYSICS LETTERS, 1982, 40 (02) : 175 - 177

[8] THERMAL-OXIDATION OF TRANSITION-METAL SILICIDES ON SI - SUMMARY [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (02) : 371 - 375

[9] MARKER EXPERIMENTS FOR DIFFUSION IN THE SILICIDE DURING OXIDATION OF PDSI, PD2SI, COSI2, AND NISI2 FILMS ON [SI] [J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (09) : 5404 - 5405

[10] BAUER RS, 1983, SURFACES INTERFACES