CHEMISTRY OF S/GAAS AND METAL S/GAAS SYSTEMS

被引:33
作者
SUGAHARA, H
OSHIMA, M
OIGAWA, H
NANNICHI, Y
机构
[1] NIPPON TELEGRAPH & TEL PUBL CORP, APPL ELECTR LABS, MUSASHINO, TOKYO 180, JAPAN
[2] UNIV TSUKUBA, INST MAT SCI, TSUKUBA, IBARAKI 305, JAPAN
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1993年 / 11卷 / 01期
关键词
D O I
10.1116/1.578719
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Bonding states and the band bending of S/n-GaAs (001) and metal/S/n-GaAs (001) systems are studied by synchrotron radiation photoemission spectroscopy (SRPES). The difference in the surface chemistry between the (NH4)2Sx-treated GaAs and the sulfur-chemisorbed GaAs is explained well by the formation of the sulfur-rich transition layer for the (NH4)2Sx-treated GaAs. A structural model for the annealed S/GaAs (001) system is proposed, in which the surface is terminated with Ga-S bonds. The barrier height of the Al, Au, and In Schottky contacts on (NH4)2Sx-treated n-GaAs is also determined to be about 0.4, 0.7, and 0.3 eV, respectively, by SRPES for the first time, which are in fairly good agreement with I-V characteristics of the metal/S/n-GaAs Schottky diodes. It is found that the oxide-free interface with a sulfur interlayer plays an important role for the metal-dependent Schottky barrier formation.
引用
收藏
页码:52 / 59
页数:8
相关论文
共 25 条
[1]   RELAXATION DURING PHOTOEMISSION AND LMM AUGER DECAY IN ARSENIC AND SOME OF ITS COMPOUNDS [J].
BAHL, MK ;
WOODALL, RO ;
WATSON, RL ;
IRGOLIC, KJ .
JOURNAL OF CHEMICAL PHYSICS, 1976, 64 (03) :1210-1218
[2]   EFFECT OF SODIUM SULFIDE TREATMENT ON BAND BENDING IN GAAS [J].
BESSER, RS ;
HELMS, CR .
APPLIED PHYSICS LETTERS, 1988, 52 (20) :1707-1709
[3]   COMPARISON OF SURFACE-PROPERTIES OF SODIUM SULFIDE AND AMMONIUM SULFIDE PASSIVATION OF GAAS [J].
BESSER, RS ;
HELMS, CR .
JOURNAL OF APPLIED PHYSICS, 1989, 65 (11) :4306-4310
[4]   METAL-DEPENDENT SCHOTTKY-BARRIER HEIGHT WITH THE (NH4)2SX-TREATED GAAS [J].
FAN, JF ;
OIGAWA, H ;
NANNICHI, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1988, 27 (11) :L2125-L2127
[5]   THE EFFECT OF (NH4)2S TREATMENT ON THE INTERFACE CHARACTERISTICS OF GAAS MIS STRUCTURES [J].
FAN, JF ;
OIGAWA, H ;
NANNICHI, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1988, 27 (07) :L1331-L1333
[6]   METAL-ANION BOND STRENGTH AND ROOM-TEMPERATURE DIFFUSION AT METAL/GAAS INTERFACES - TRANSITION VERSUS RARE-EARTH VERSUS AU METAL OVERLAYERS [J].
GRIONI, M ;
JOYCE, JJ ;
WEAVER, JH .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1986, 4 (03) :965-968
[7]   ADSORPTION OF SULFUR ON (100) AND (111) FACES OF PLATINUM - LEED AND AES STUDY [J].
HEEGEMANN, W ;
MEISTER, KH ;
BECHTOLD, E ;
HAYEK, K .
SURFACE SCIENCE, 1975, 49 (01) :161-180
[8]   STUDY OF CORE ELECTRON BINDING-ENERGIES IN SOME GROUP IIIA, VB, AND VIB COMPOUNDS [J].
MCGUIRE, GE ;
SCHWEITZ.GK ;
CARLSON, TA .
INORGANIC CHEMISTRY, 1973, 12 (10) :2450-2453
[9]   A MODEL TO EXPLAIN THE EFFECTIVE PASSIVATION OF THE GAAS SURFACE BY (NH4)2SX TREATMENT [J].
NANNICHI, Y ;
FAN, JF ;
OIGAWA, H ;
KOMA, A .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1988, 27 (12) :L2367-L2369
[10]   ON THE FERMI LEVEL PINNING BEHAVIOR OF METAL/III-V SEMICONDUCTOR INTERFACES [J].
NEWMAN, N ;
SPICER, WE ;
KENDELEWICZ, T ;
LINDAU, I .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (04) :931-938