SIMULATION OF INTERFACE COUPLING EFFECTS IN ULTRA-THIN SILICON ON INSULATOR MOSFETS

被引:1
作者
HASSEINBEY, A [1 ]
CRISTOLOVEANU, S [1 ]
机构
[1] ENSERG,PHYS COMPOSANTS & SEMICOND LAB,CNRS,F-38016 GRENOBLE,FRANCE
关键词
D O I
10.1108/eb010111
中图分类号
TP39 [计算机的应用];
学科分类号
081203 ; 0835 ;
摘要
[No abstract available]
引用
收藏
页码:513 / 517
页数:5
相关论文
共 8 条
[1]   DOUBLE-GATE SILICON-ON-INSULATOR TRANSISTOR WITH VOLUME INVERSION - A NEW DEVICE WITH GREATLY ENHANCED PERFORMANCE [J].
BALESTRA, F ;
CRISTOLOVEANU, S ;
BENACHIR, M ;
BRINI, J ;
ELEWA, T .
IEEE ELECTRON DEVICE LETTERS, 1987, 8 (09) :410-412
[2]   SUBTHRESHOLD SLOPE OF THIN-FILM SOI MOSFETS [J].
COLINGE, JP .
IEEE ELECTRON DEVICE LETTERS, 1986, 7 (04) :244-246
[3]   REDUCTION OF FLOATING SUBSTRATE EFFECT IN THIN-FILM SOI MOSFETS [J].
COLINGE, JP .
ELECTRONICS LETTERS, 1986, 22 (04) :187-188
[4]   A REVIEW OF THE ELECTRICAL-PROPERTIES OF SIMOX SUBSTRATES AND THEIR IMPACT ON DEVICE PERFORMANCE [J].
CRISTOLOVEANU, S .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1991, 138 (10) :3131-3139
[5]  
HASSEINBEY A, 1991, MODELLING CHARACTERI, P251
[6]   PROPERTIES OF ULTRA-THIN WAFER-BONDED SILICON-ON-INSULATOR MOSFETS [J].
MAZHARI, B ;
CRISTOLOVEANU, S ;
IOANNOU, DE ;
CAVIGLIA, AL .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1991, 38 (06) :1289-1295
[7]   INFLUENCE OF SERIES RESISTANCES AND INTERFACE COUPLING ON THE TRANSCONDUCTANCE OF FULLY-DEPLETED SILICON-ON-INSULATOR MOSFETS [J].
OUISSE, T ;
CRISTOLOVEANU, S ;
BOREL, G .
SOLID-STATE ELECTRONICS, 1992, 35 (02) :141-149
[8]   INCREASED DRAIN SATURATION CURRENT IN ULTRA-THIN SILICON-ON-INSULATOR (SOI) MOS-TRANSISTORS [J].
STURM, JC ;
TOKUNAGA, K ;
COLINGE, JP .
IEEE ELECTRON DEVICE LETTERS, 1988, 9 (09) :460-463