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SIMULATION OF INTERFACE COUPLING EFFECTS IN ULTRA-THIN SILICON ON INSULATOR MOSFETS
被引:1
作者
:
HASSEINBEY, A
论文数:
0
引用数:
0
h-index:
0
机构:
ENSERG,PHYS COMPOSANTS & SEMICOND LAB,CNRS,F-38016 GRENOBLE,FRANCE
ENSERG,PHYS COMPOSANTS & SEMICOND LAB,CNRS,F-38016 GRENOBLE,FRANCE
HASSEINBEY, A
[
1
]
CRISTOLOVEANU, S
论文数:
0
引用数:
0
h-index:
0
机构:
ENSERG,PHYS COMPOSANTS & SEMICOND LAB,CNRS,F-38016 GRENOBLE,FRANCE
ENSERG,PHYS COMPOSANTS & SEMICOND LAB,CNRS,F-38016 GRENOBLE,FRANCE
CRISTOLOVEANU, S
[
1
]
机构
:
[1]
ENSERG,PHYS COMPOSANTS & SEMICOND LAB,CNRS,F-38016 GRENOBLE,FRANCE
来源
:
COMPEL-THE INTERNATIONAL JOURNAL FOR COMPUTATION AND MATHEMATICS IN ELECTRICAL AND ELECTRONIC ENGINEERING
|
1992年
/ 11卷
/ 04期
关键词
:
D O I
:
10.1108/eb010111
中图分类号
:
TP39 [计算机的应用];
学科分类号
:
081203 ;
0835 ;
摘要
:
[No abstract available]
引用
收藏
页码:513 / 517
页数:5
相关论文
共 8 条
[1]
DOUBLE-GATE SILICON-ON-INSULATOR TRANSISTOR WITH VOLUME INVERSION - A NEW DEVICE WITH GREATLY ENHANCED PERFORMANCE
[J].
BALESTRA, F
论文数:
0
引用数:
0
h-index:
0
BALESTRA, F
;
CRISTOLOVEANU, S
论文数:
0
引用数:
0
h-index:
0
CRISTOLOVEANU, S
;
BENACHIR, M
论文数:
0
引用数:
0
h-index:
0
BENACHIR, M
;
BRINI, J
论文数:
0
引用数:
0
h-index:
0
BRINI, J
;
ELEWA, T
论文数:
0
引用数:
0
h-index:
0
ELEWA, T
.
IEEE ELECTRON DEVICE LETTERS,
1987,
8
(09)
:410
-412
[2]
SUBTHRESHOLD SLOPE OF THIN-FILM SOI MOSFETS
[J].
COLINGE, JP
论文数:
0
引用数:
0
h-index:
0
COLINGE, JP
.
IEEE ELECTRON DEVICE LETTERS,
1986,
7
(04)
:244
-246
[3]
REDUCTION OF FLOATING SUBSTRATE EFFECT IN THIN-FILM SOI MOSFETS
[J].
COLINGE, JP
论文数:
0
引用数:
0
h-index:
0
机构:
Hewlett Packard Lab, Palo Alto, CA,, USA, Hewlett Packard Lab, Palo Alto, CA, USA
COLINGE, JP
.
ELECTRONICS LETTERS,
1986,
22
(04)
:187
-188
[4]
A REVIEW OF THE ELECTRICAL-PROPERTIES OF SIMOX SUBSTRATES AND THEIR IMPACT ON DEVICE PERFORMANCE
[J].
CRISTOLOVEANU, S
论文数:
0
引用数:
0
h-index:
0
机构:
Laboratoire de Physique des Composants à Semiconducteurs (UA-CNRS), Institut National Polytechnique de Grenoble, ENSERG, BP 257
CRISTOLOVEANU, S
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1991,
138
(10)
:3131
-3139
[5]
HASSEINBEY A, 1991, MODELLING CHARACTERI, P251
[6]
PROPERTIES OF ULTRA-THIN WAFER-BONDED SILICON-ON-INSULATOR MOSFETS
[J].
MAZHARI, B
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MARYLAND,DEPT ELECT ENGN,COLLEGE PK,MD 20742
MAZHARI, B
;
CRISTOLOVEANU, S
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MARYLAND,DEPT ELECT ENGN,COLLEGE PK,MD 20742
CRISTOLOVEANU, S
;
IOANNOU, DE
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MARYLAND,DEPT ELECT ENGN,COLLEGE PK,MD 20742
IOANNOU, DE
;
CAVIGLIA, AL
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MARYLAND,DEPT ELECT ENGN,COLLEGE PK,MD 20742
CAVIGLIA, AL
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1991,
38
(06)
:1289
-1295
[7]
INFLUENCE OF SERIES RESISTANCES AND INTERFACE COUPLING ON THE TRANSCONDUCTANCE OF FULLY-DEPLETED SILICON-ON-INSULATOR MOSFETS
[J].
OUISSE, T
论文数:
0
引用数:
0
h-index:
0
机构:
INST NATL POLYTECH,ENSERG,CNRS,UA,PHYS COMPOSANTS & SEMICONDUCTEURS LAB,F-38016 GRENOBLE,FRANCE
INST NATL POLYTECH,ENSERG,CNRS,UA,PHYS COMPOSANTS & SEMICONDUCTEURS LAB,F-38016 GRENOBLE,FRANCE
OUISSE, T
;
CRISTOLOVEANU, S
论文数:
0
引用数:
0
h-index:
0
机构:
INST NATL POLYTECH,ENSERG,CNRS,UA,PHYS COMPOSANTS & SEMICONDUCTEURS LAB,F-38016 GRENOBLE,FRANCE
INST NATL POLYTECH,ENSERG,CNRS,UA,PHYS COMPOSANTS & SEMICONDUCTEURS LAB,F-38016 GRENOBLE,FRANCE
CRISTOLOVEANU, S
;
BOREL, G
论文数:
0
引用数:
0
h-index:
0
机构:
INST NATL POLYTECH,ENSERG,CNRS,UA,PHYS COMPOSANTS & SEMICONDUCTEURS LAB,F-38016 GRENOBLE,FRANCE
INST NATL POLYTECH,ENSERG,CNRS,UA,PHYS COMPOSANTS & SEMICONDUCTEURS LAB,F-38016 GRENOBLE,FRANCE
BOREL, G
.
SOLID-STATE ELECTRONICS,
1992,
35
(02)
:141
-149
[8]
INCREASED DRAIN SATURATION CURRENT IN ULTRA-THIN SILICON-ON-INSULATOR (SOI) MOS-TRANSISTORS
[J].
STURM, JC
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD LABS,PALO ALTO,CA 94305
HEWLETT PACKARD LABS,PALO ALTO,CA 94305
STURM, JC
;
TOKUNAGA, K
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD LABS,PALO ALTO,CA 94305
HEWLETT PACKARD LABS,PALO ALTO,CA 94305
TOKUNAGA, K
;
COLINGE, JP
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD LABS,PALO ALTO,CA 94305
HEWLETT PACKARD LABS,PALO ALTO,CA 94305
COLINGE, JP
.
IEEE ELECTRON DEVICE LETTERS,
1988,
9
(09)
:460
-463
←
1
→
共 8 条
[1]
DOUBLE-GATE SILICON-ON-INSULATOR TRANSISTOR WITH VOLUME INVERSION - A NEW DEVICE WITH GREATLY ENHANCED PERFORMANCE
[J].
BALESTRA, F
论文数:
0
引用数:
0
h-index:
0
BALESTRA, F
;
CRISTOLOVEANU, S
论文数:
0
引用数:
0
h-index:
0
CRISTOLOVEANU, S
;
BENACHIR, M
论文数:
0
引用数:
0
h-index:
0
BENACHIR, M
;
BRINI, J
论文数:
0
引用数:
0
h-index:
0
BRINI, J
;
ELEWA, T
论文数:
0
引用数:
0
h-index:
0
ELEWA, T
.
IEEE ELECTRON DEVICE LETTERS,
1987,
8
(09)
:410
-412
[2]
SUBTHRESHOLD SLOPE OF THIN-FILM SOI MOSFETS
[J].
COLINGE, JP
论文数:
0
引用数:
0
h-index:
0
COLINGE, JP
.
IEEE ELECTRON DEVICE LETTERS,
1986,
7
(04)
:244
-246
[3]
REDUCTION OF FLOATING SUBSTRATE EFFECT IN THIN-FILM SOI MOSFETS
[J].
COLINGE, JP
论文数:
0
引用数:
0
h-index:
0
机构:
Hewlett Packard Lab, Palo Alto, CA,, USA, Hewlett Packard Lab, Palo Alto, CA, USA
COLINGE, JP
.
ELECTRONICS LETTERS,
1986,
22
(04)
:187
-188
[4]
A REVIEW OF THE ELECTRICAL-PROPERTIES OF SIMOX SUBSTRATES AND THEIR IMPACT ON DEVICE PERFORMANCE
[J].
CRISTOLOVEANU, S
论文数:
0
引用数:
0
h-index:
0
机构:
Laboratoire de Physique des Composants à Semiconducteurs (UA-CNRS), Institut National Polytechnique de Grenoble, ENSERG, BP 257
CRISTOLOVEANU, S
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1991,
138
(10)
:3131
-3139
[5]
HASSEINBEY A, 1991, MODELLING CHARACTERI, P251
[6]
PROPERTIES OF ULTRA-THIN WAFER-BONDED SILICON-ON-INSULATOR MOSFETS
[J].
MAZHARI, B
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MARYLAND,DEPT ELECT ENGN,COLLEGE PK,MD 20742
MAZHARI, B
;
CRISTOLOVEANU, S
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MARYLAND,DEPT ELECT ENGN,COLLEGE PK,MD 20742
CRISTOLOVEANU, S
;
IOANNOU, DE
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MARYLAND,DEPT ELECT ENGN,COLLEGE PK,MD 20742
IOANNOU, DE
;
CAVIGLIA, AL
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MARYLAND,DEPT ELECT ENGN,COLLEGE PK,MD 20742
CAVIGLIA, AL
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1991,
38
(06)
:1289
-1295
[7]
INFLUENCE OF SERIES RESISTANCES AND INTERFACE COUPLING ON THE TRANSCONDUCTANCE OF FULLY-DEPLETED SILICON-ON-INSULATOR MOSFETS
[J].
OUISSE, T
论文数:
0
引用数:
0
h-index:
0
机构:
INST NATL POLYTECH,ENSERG,CNRS,UA,PHYS COMPOSANTS & SEMICONDUCTEURS LAB,F-38016 GRENOBLE,FRANCE
INST NATL POLYTECH,ENSERG,CNRS,UA,PHYS COMPOSANTS & SEMICONDUCTEURS LAB,F-38016 GRENOBLE,FRANCE
OUISSE, T
;
CRISTOLOVEANU, S
论文数:
0
引用数:
0
h-index:
0
机构:
INST NATL POLYTECH,ENSERG,CNRS,UA,PHYS COMPOSANTS & SEMICONDUCTEURS LAB,F-38016 GRENOBLE,FRANCE
INST NATL POLYTECH,ENSERG,CNRS,UA,PHYS COMPOSANTS & SEMICONDUCTEURS LAB,F-38016 GRENOBLE,FRANCE
CRISTOLOVEANU, S
;
BOREL, G
论文数:
0
引用数:
0
h-index:
0
机构:
INST NATL POLYTECH,ENSERG,CNRS,UA,PHYS COMPOSANTS & SEMICONDUCTEURS LAB,F-38016 GRENOBLE,FRANCE
INST NATL POLYTECH,ENSERG,CNRS,UA,PHYS COMPOSANTS & SEMICONDUCTEURS LAB,F-38016 GRENOBLE,FRANCE
BOREL, G
.
SOLID-STATE ELECTRONICS,
1992,
35
(02)
:141
-149
[8]
INCREASED DRAIN SATURATION CURRENT IN ULTRA-THIN SILICON-ON-INSULATOR (SOI) MOS-TRANSISTORS
[J].
STURM, JC
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD LABS,PALO ALTO,CA 94305
HEWLETT PACKARD LABS,PALO ALTO,CA 94305
STURM, JC
;
TOKUNAGA, K
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD LABS,PALO ALTO,CA 94305
HEWLETT PACKARD LABS,PALO ALTO,CA 94305
TOKUNAGA, K
;
COLINGE, JP
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD LABS,PALO ALTO,CA 94305
HEWLETT PACKARD LABS,PALO ALTO,CA 94305
COLINGE, JP
.
IEEE ELECTRON DEVICE LETTERS,
1988,
9
(09)
:460
-463
←
1
→