Extensive material, device, and focal plane array (FPA) reproducibility data are presented to demonstrate significant advances made in the molecular beam epitaxial (MBE) HgCdTe technology. Excellent control of the composition, growth rate, layer thickness, doping concentration, dislocation density, and transport characteristics has been demonstrated. A change in the bandgap is readily achieved by adjusting the beam fluxes, demonstrating the flexibility of MBE in responding to the needs of infrared detection applications in various spectral bands. High performance of photodiodes fabricated on MBE HgCdTe layers reflects on the overall quality of the grown material. The photodiodes were planar p-on-n junctions fabricated by As ion-implantation into indium doped, n-type, in situ grown double layer heterostructures. At 77K, dicdes fabricated on MBE Hg1-xCdxTe with x approximate to 0.30 (lambda(infinity) approximate to 5.6 mu m), x approximate to 0.26 (lambda(infinity) approximate to 7 mu m), x approximate to 0.23 (lambda(infinity) approximate to 10 mu m) show R(0)A products in excess of 1 x 10(6) ohm-cm(2), 7 x 10(5) ohm-cm(2), and 3 x 10(2) ohm-cm(2), respectively. These devices also show high quantum efficiency. As a means to assess the uniformity of the MBE HgCdTe material, two-dimensional 64 x 64 and 128 x 128 mosaic detector arrays were hybridized to Si multiplexers. These focal plane arrays show an operability as high as 97% at 77K for the x approximate to 0.23 spectral band and 93% at 77K for the x approximate to 0.26 spectral band. The operability is limited partly by the density of void-type defects that are present in the MBE grown layers and are easily identified under an optical microscope.