CHARACTERISTICS OF REPULSIVE CENTERS IN SILICON

被引:1
作者
LEMKE, H
机构
来源
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1981年 / 66卷 / 02期
关键词
D O I
10.1002/pssa.2210660216
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:541 / 549
页数:9
相关论文
共 19 条
[11]   DONATION CHARACTERISTICS OF IRON IN SILICON [J].
LEMKE, H .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1981, 64 (01) :215-224
[12]   RELATIONSHIPS BETWEEN NONRADIATIVE MULTIPHONON CARRIER-CAPTURE PROPERTIES OF DEEP CHARGED AND NEUTRAL CENTERS IN SEMICONDUCTORS [J].
PASSLER, R .
PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS, 1976, 78 (02) :625-635
[13]   TEMPERATURE DEPENDENCES OF NONRADIATIVE MULTIPHONON CARRIER CAPTURE AND EJECTION PROPERTIES OF DEEP TRAPS IN SEMICONDUCTORS .1. THEORETICAL RESULTS [J].
PASSLER, R .
PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS, 1978, 85 (01) :203-215
[14]   MULTIPHONON CAPTURE RATE IN SEMICONDUCTORS [J].
RIDLEY, BK .
SOLID-STATE ELECTRONICS, 1978, 21 (11-1) :1319-1323
[15]   IMPACT IONIZATION OF IMPURITIES IN GERMANIUM [J].
SCLAR, N ;
BURSTEIN, E .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1957, 2 (01) :1-23
[16]  
SINYAVSKII EP, 1967, FIZ TVERD TELA, V9, P1464
[17]  
SZE SM, 1969, PHYSICS SEMICONDUCTO
[18]  
ZHDANOVA NG, 1964, FIZ TVERD TELA, V6, P440
[19]  
[No title captured]