GE DIFFUSION INTO GAAS BY PULSED LASER IRRADIATION

被引:7
作者
GARCIA, BJ
MARTINEZ, J
PIQUERAS, J
CASTANO, JL
MUNOZYAGUE, A
机构
[1] CTR NACL MICROELECTR, E-28006 MADRID, SPAIN
[2] CNRS, AUTOMAT & ANAL SYST LAB, F-31400 TOULOUSE, FRANCE
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1988年 / 46卷 / 03期
关键词
D O I
10.1007/BF00939263
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:191 / 196
页数:6
相关论文
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