METAL-OXIDE-SEMICONDUCTOR INSTABILITY PRODUCED BY ELECTRON-BEAM EVAPORATION OF ALUMINUM GATES

被引：6

作者：

LEE, HS

机构：

来源：

IEEE TRANSACTIONS ON ELECTRON DEVICES | 1978年 / 25卷 / 07期

关键词：

D O I：

10.1109/T-ED.1978.19172

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：795 / 799

页数：5

共 16 条

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