THE INFLUENCE OF UNSTEADY STATE PLASMA ON THE PROPERTIES OF A-SI-H FILMS FORMED BY GLOW-DISCHARGE CHEMICAL VAPOR-DEPOSITION

被引：3

作者：

HAMAMOTO, K ^{[1
]}

OZAKI, H ^{[1
]}

NAKATANI, K ^{[1
]}

YANO, M ^{[1
]}

SUZUKI, K ^{[1
]}

OKANIWA, H ^{[1
]}

机构：

[1] TEIJIN LTD,ADV FILM PROD LAB,HINO,TOKYO 191,JAPAN

来源：

THIN SOLID FILMS | 1989年 / 177卷

关键词：

D O I：

10.1016/0040-6090(89)90564-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：161 / 170

页数：10

共 16 条

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