LIFT-OFF PATTERNING OF SPUTTERED SIO2-FILMS

被引：12

作者：

SERIKAWA, T

YACHI, T

机构：

来源：

关键词：

D O I：

10.1149/1.2127531

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：918 / 919

页数：2

共 6 条

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BLECH, IA .

[2]

HANSE WG, 1979, IEEE T ELECTRON DEVI, V26, P360

[3] SPUTTERED INSULATOR FILM CONTOURING OVER SUBSTRATE TOPOGRAPHY [J].

KENNEDY, TN .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (06) :1135-1137

[4] PROFILE CONTROL BY REACTIVE SPUTTER ETCHING [J].

LEHMANN, HW ;

WIDMER, R .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02) :319-326

[5] SPUTTERED SIO2 DEPOSITED OVER A STEP [J].

STANDLEY, CL ;

JONES, RE ;

MAISSEL, LI .

[6]

URBANEK K, 1977, SOLID STATE TECHNOL, V20, P87