PRINCIPLES OF PLASMA-ACTIVATED CHEMICAL VAPOR-DEPOSITION

被引：20

作者：

INSPEKTORKOREN, A

机构：

来源：

SURFACE & COATINGS TECHNOLOGY | 1987年 / 33卷 / 1-4期

关键词：

D O I：

10.1016/0257-8972(87)90174-5

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：31 / 48

页数：18

共 141 条

[1] PROGRESS IN THE APPLICATIONS OF PLASMA SURFACE MODIFICATIONS AND CORRELATIONS WITH THE CHEMICAL-PROPERTIES OF THE PLASMA PHASE [J].

AMOUROUX, J ;

GICQUEL, A ;

CAVVADIAS, S ;

MORVAN, D ;

AREFI, F .

PURE AND APPLIED CHEMISTRY, 1985, 57 (09) :1207-1222

[2] ELECTRICAL AND OPTICAL-PROPERTIES OF AMORPHOUS SILICON-CARBIDE, SILICON-NITRIDE AND GERMANIUM CARBIDE PREPARED BY GLOW-DISCHARGE TECHNIQUE [J].

ANDERSON, DA ;

SPEAR, WE .

PHILOSOPHICAL MAGAZINE, 1977, 35 (01) :1-16

[3] ULTIMATE AND SECONDARY ELECTRON ENERGIES IN THE NEGATIVE GLOW OF A COLD-CATHODE DISCHARGE IN HELIUM [J].

ANDERSON, JM .

JOURNAL OF APPLIED PHYSICS, 1960, 31 (03) :511-515

[4]

ANDERSSON LP, 1981, THIN SOLID FILMS, V80, P227

[5] THE PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION OF TIC, TIN AND TICXN1-X [J].

ARCHER, NJ .

THIN SOLID FILMS, 1981, 80 (1-3) :221-225

[6] THE ROLE OF HYDROGEN IN THE RADICAL POLYMERIZATION MECHANISM OF HYDROCARBONS AND CHLOROSILANES IN A LOW-PRESSURE MICROWAVE PLASMA [J].

AVNI, R ;

CARMI, U ;

INSPEKTOR, A ;

ROSENTHAL, I .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (04) :1813-1820

[7] RECENT ADVANCES IN CERAMIC COATINGS OBTAINED BY CHEMICAL VAPOR-DEPOSITION AND PLASMA PROCESSING DEPOSITION [J].

AVNI, R ;

CARMI, U .

MATERIALS SCIENCE AND ENGINEERING, 1985, 71 (1-2) :341-354

[8]

AVNI R, 1983, 6TH P INT S PLASM CH, V2, P522

[9]

AVNI R, 1984, NASA TP2301

[10]

Bell A. T., 1974, Techniques and applications of plasma chemistry, P1

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