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CONTACT REACTION BETWEEN SI AND RARE-EARTH-METALS
被引:150
作者
:
THOMPSON, RD
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
THOMPSON, RD
TSAUR, BY
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
TSAUR, BY
TU, KN
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
TU, KN
机构
:
[1]
CALTECH,PASADENA,CA 91109
[2]
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
来源
:
APPLIED PHYSICS LETTERS
|
1981年
/ 38卷
/ 07期
关键词
:
D O I
:
10.1063/1.92442
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:535 / 537
页数:3
相关论文
共 14 条
[1]
[Anonymous], 1978, HDB BINARY PHASE DIA
[2]
THE FORMATION OF SILICIDES FROM THIN-FILMS OF SOME RARE-EARTH-METALS
BAGLIN, JE
论文数:
0
引用数:
0
h-index:
0
BAGLIN, JE
HEURLE, FMD
论文数:
0
引用数:
0
h-index:
0
HEURLE, FMD
PETERSSON, CS
论文数:
0
引用数:
0
h-index:
0
PETERSSON, CS
[J].
APPLIED PHYSICS LETTERS,
1980,
36
(07)
: 594
-
596
[3]
GROWTH KINETICS OBSERVED IN FORMATION OF METAL SILICIDES ON SILICON
BOWER, RW
论文数:
0
引用数:
0
h-index:
0
BOWER, RW
MAYER, JW
论文数:
0
引用数:
0
h-index:
0
MAYER, JW
[J].
APPLIED PHYSICS LETTERS,
1972,
20
(09)
: 359
-
&
[4]
SILICIDE FORMATION AND INTERDIFFUSION EFFECTS IN SI-TA, SIO2-TA AND SI-PTSI-TA THIN-FILM STRUCTURES
CHRISTOU, A
论文数:
0
引用数:
0
h-index:
0
机构:
USN,RES LAB,WASHINGTON,DC 20375
USN,RES LAB,WASHINGTON,DC 20375
CHRISTOU, A
DAY, HM
论文数:
0
引用数:
0
h-index:
0
机构:
USN,RES LAB,WASHINGTON,DC 20375
USN,RES LAB,WASHINGTON,DC 20375
DAY, HM
[J].
JOURNAL OF ELECTRONIC MATERIALS,
1976,
5
(01)
: 1
-
12
[5]
KRAUTLE H, 1974, P INT C APPLICATIONS, P193
[6]
REACTION-KINETICS OF TUNGSTEN THIN-FILMS ON SILICON (100) SURFACES
LOCKER, LD
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
LOCKER, LD
CAPIO, CD
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
CAPIO, CD
[J].
JOURNAL OF APPLIED PHYSICS,
1973,
44
(10)
: 4366
-
4369
[7]
SILICIDE FORMATION IN THIN MOLYBDENUM AND TUNGSTEN FILMS ON SINGLE-CRYSTAL SILICON SUBSTRATES AT RELATIVELY LOW-TEMPERATURES
OERTEL, B
论文数:
0
引用数:
0
h-index:
0
机构:
TH ILMENAU,SEKT PHYS & TECH ELEKTR BAUELEMENTE,ILMENAU,DEUTSCH DEM REP
TH ILMENAU,SEKT PHYS & TECH ELEKTR BAUELEMENTE,ILMENAU,DEUTSCH DEM REP
OERTEL, B
SPERLING, R
论文数:
0
引用数:
0
h-index:
0
机构:
TH ILMENAU,SEKT PHYS & TECH ELEKTR BAUELEMENTE,ILMENAU,DEUTSCH DEM REP
TH ILMENAU,SEKT PHYS & TECH ELEKTR BAUELEMENTE,ILMENAU,DEUTSCH DEM REP
SPERLING, R
[J].
THIN SOLID FILMS,
1976,
37
(02)
: 185
-
194
[8]
THOMPSON RD, 1979, RC7989 IBM REP
[9]
Tu K. N., 1978, THIN FILMS INTERDIFF
[10]
FORMATION OF VANADIUM SILICIDES BY INTERACTIONS OF V WITH BARE AND OXIDIZED SI WAFERS
TU, KN
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
TU, KN
ZIEGLER, JF
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
ZIEGLER, JF
KIRCHER, CJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
KIRCHER, CJ
[J].
APPLIED PHYSICS LETTERS,
1973,
23
(09)
: 493
-
495
←
1
2
→
共 14 条
[1]
[Anonymous], 1978, HDB BINARY PHASE DIA
[2]
THE FORMATION OF SILICIDES FROM THIN-FILMS OF SOME RARE-EARTH-METALS
BAGLIN, JE
论文数:
0
引用数:
0
h-index:
0
BAGLIN, JE
HEURLE, FMD
论文数:
0
引用数:
0
h-index:
0
HEURLE, FMD
PETERSSON, CS
论文数:
0
引用数:
0
h-index:
0
PETERSSON, CS
[J].
APPLIED PHYSICS LETTERS,
1980,
36
(07)
: 594
-
596
[3]
GROWTH KINETICS OBSERVED IN FORMATION OF METAL SILICIDES ON SILICON
BOWER, RW
论文数:
0
引用数:
0
h-index:
0
BOWER, RW
MAYER, JW
论文数:
0
引用数:
0
h-index:
0
MAYER, JW
[J].
APPLIED PHYSICS LETTERS,
1972,
20
(09)
: 359
-
&
[4]
SILICIDE FORMATION AND INTERDIFFUSION EFFECTS IN SI-TA, SIO2-TA AND SI-PTSI-TA THIN-FILM STRUCTURES
CHRISTOU, A
论文数:
0
引用数:
0
h-index:
0
机构:
USN,RES LAB,WASHINGTON,DC 20375
USN,RES LAB,WASHINGTON,DC 20375
CHRISTOU, A
DAY, HM
论文数:
0
引用数:
0
h-index:
0
机构:
USN,RES LAB,WASHINGTON,DC 20375
USN,RES LAB,WASHINGTON,DC 20375
DAY, HM
[J].
JOURNAL OF ELECTRONIC MATERIALS,
1976,
5
(01)
: 1
-
12
[5]
KRAUTLE H, 1974, P INT C APPLICATIONS, P193
[6]
REACTION-KINETICS OF TUNGSTEN THIN-FILMS ON SILICON (100) SURFACES
LOCKER, LD
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
LOCKER, LD
CAPIO, CD
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
CAPIO, CD
[J].
JOURNAL OF APPLIED PHYSICS,
1973,
44
(10)
: 4366
-
4369
[7]
SILICIDE FORMATION IN THIN MOLYBDENUM AND TUNGSTEN FILMS ON SINGLE-CRYSTAL SILICON SUBSTRATES AT RELATIVELY LOW-TEMPERATURES
OERTEL, B
论文数:
0
引用数:
0
h-index:
0
机构:
TH ILMENAU,SEKT PHYS & TECH ELEKTR BAUELEMENTE,ILMENAU,DEUTSCH DEM REP
TH ILMENAU,SEKT PHYS & TECH ELEKTR BAUELEMENTE,ILMENAU,DEUTSCH DEM REP
OERTEL, B
SPERLING, R
论文数:
0
引用数:
0
h-index:
0
机构:
TH ILMENAU,SEKT PHYS & TECH ELEKTR BAUELEMENTE,ILMENAU,DEUTSCH DEM REP
TH ILMENAU,SEKT PHYS & TECH ELEKTR BAUELEMENTE,ILMENAU,DEUTSCH DEM REP
SPERLING, R
[J].
THIN SOLID FILMS,
1976,
37
(02)
: 185
-
194
[8]
THOMPSON RD, 1979, RC7989 IBM REP
[9]
Tu K. N., 1978, THIN FILMS INTERDIFF
[10]
FORMATION OF VANADIUM SILICIDES BY INTERACTIONS OF V WITH BARE AND OXIDIZED SI WAFERS
TU, KN
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
TU, KN
ZIEGLER, JF
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
ZIEGLER, JF
KIRCHER, CJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
KIRCHER, CJ
[J].
APPLIED PHYSICS LETTERS,
1973,
23
(09)
: 493
-
495
←
1
2
→