ELECTRODE MATERIAL AND GEOMETRY-EFFECTS ON THE FORMATION AND ELECTRICAL-PROPERTIES OF PARTICLE TRAPS IN A PLASMA ETCH SYSTEM

被引：5

作者：

COLLINS, SM

OHANLON, JF

BECK, SE

HONG, L

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1993年 / 11卷 / 04期

关键词：

D O I：

10.1116/1.578537

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Langmuir probe measurements of the near-sheath plasma region in a plasma etch system reveal that geometric discontinuities in the powered electrode surface lead to areas of elevated plasma potential. Particles trapped in the plasma in these regions are also observed optically using laser light scattering and video detection. Electrode material discontinuities are also shown to affect the plasma potential and particle traps. Maps of plasma potential are presented for plasmas above various electrode configurations.

引用

页码：1264 / 1267

页数：4

共 12 条

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