ELECTRON-EMISSION FROM DEPLETION LAYERS OF SILICON P-N-JUNCTIONS

被引:11
作者
VANGORKOM, GGP
HOEBERECHTS, AME
机构
关键词
D O I
10.1063/1.328114
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:3780 / 3785
页数:6
相关论文
共 24 条
[1]  
Abbas S. A., 1976, 14th Annual Proceedings Reliability Physics, P38, DOI 10.1109/IRPS.1976.362719
[2]   DISTRIBUTION FUNCTIONS AND IONIZATION RATES FOR HOT ELECTRONS IN SEMICONDUCTORS [J].
BARAFF, GA .
PHYSICAL REVIEW, 1962, 128 (06) :2507-&
[3]   HOT-ELECTRON EMISSION FROM SHALLO P-N JUNCTIONS IN SILICON [J].
BARTELINK, D ;
MOLL, JL ;
MEYER, NI .
PHYSICAL REVIEW, 1963, 130 (03) :972-+
[4]   SOME PROPERTIES OF REVERSE-BIASED SILICON-CARBIDE P-N-JUNCTION COLD CATHODES [J].
BELLAU, RV ;
WIDDOWSON, AE .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1972, 5 (03) :656-+
[5]  
Bergeron D. L., 1977, 15th Annual Proceedings Reliability Physics, P10, DOI 10.1109/IRPS.1977.362765
[6]   AVALANCHE INJECTION INTO OXIDE IN SILICON GATE-CONTROLLED DEVICES .2. EXPERIMENTAL RESULTS [J].
BULUCEA, C .
SOLID-STATE ELECTRONICS, 1975, 18 (05) :381-391
[7]   AVALANCHE INJECTION INTO OXIDE IN SILICON GATE-CONTROLLED DEVICES .1. THEORY [J].
BULUCEA, C .
SOLID-STATE ELECTRONICS, 1975, 18 (04) :363-374
[8]   MODELING OF CHANNEL ENHANCEMENT EFFECTS ON WRITE CHARACTERISTICS OF FAMOS DEVICES [J].
CARD, HC ;
HEASELL, EL .
SOLID-STATE ELECTRONICS, 1976, 19 (11) :965-968
[9]  
CHANDHARI PK, 1977, 15TH P INT REL PHYS, P5
[10]  
Euzent B., 1977, 15th Annual Proceedings Reliability Physics, P1, DOI 10.1109/IRPS.1977.362763