LASER-ASSISTED LIQUID-FILM ETCHING

被引：2

作者：

LIM, P

BROCK, J

TRACHTENBERG, I

机构：

[1] Chemical Engineering Department, University of Texas, Austin

来源：

APPLIED PHYSICS LETTERS | 1993年 / 62卷 / 25期

关键词：

D O I：

10.1063/1.109066

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Laser-assisted liquid film etching (LALFE) is a new technique for maskless patterning of silicon substrates. This technique involves forming a thin liquid film of etchant on a silicon substrate and focusing a laser beam on the portion to be etched. Results are given for direct-writing, orientation dependent LALFE on (100) and (111)n-Si using films of polyvinyl alcohol (PVA) as a wetting agent for hydrofluoric acid on n-Si.

引用

收藏

页码：3345 / 3347

页数：3

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