NEUTRON TRANSMUTATION DOPING OF SILICON AND OTHER SEMICONDUCTING MATERIALS

被引:7
作者
HOFFMANN, HJ
机构
关键词
D O I
10.1063/1.329255
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:4070 / 4074
页数:5
相关论文
共 11 条
[1]   SILICON VACANCY - POSSIBLE ANDERSON NEGATIVE-U SYSTEM [J].
BARAFF, GA ;
KANE, EO ;
SCHLUTER, M .
PHYSICAL REVIEW LETTERS, 1979, 43 (13) :956-959
[2]  
Haas E. W., 1979, Neutron Transmutation Doping in Semiconductors, P27
[3]  
HOFFMANN HJ, 1980, PHYS REV LETT, V45, P1733, DOI 10.1103/PhysRevLett.45.1733
[4]   DENSITY OF LOCALIZED LEVELS IN AMORPHOUS SILICON [J].
HOFFMANN, HJ .
APPLIED PHYSICS, 1979, 18 (04) :427-429
[5]  
HOFFMANN HJ, 1978, THESIS U KARLSRUHE
[6]  
HUFF HR, 1977, SEMICONDUCTOR SILICO
[7]  
Lark-Horovitz K., P47
[8]  
Meese J.M., 1979, NEUTRON TRANSMUTATIO
[9]   NEUTRON TRANSMUTATION DOPING OF SILICON .1. ELECTRICAL PARAMETERS VERSUS FLUENCE [J].
MEESE, JM .
JOURNAL OF APPLIED PHYSICS, 1980, 51 (07) :3672-3676
[10]  
SZE SM, 1969, PHYSICS SEMICONDUCTO