SOME PROPERTIES OF SILICA FILM MADE BY RF GLOW DISCHARGE SPUTTERING

被引：13

作者：

KOZUMA, T

KOBAYASHI, T

HAMAGUCHI, C

NAKAI, J

FUJIOKA, T

MATSUZAWA, A

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1970年 / 9卷 / 08期

关键词：

D O I：

10.1143/JJAP.9.983

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：983 / +

页数：1

共 30 条

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