ANNEALING STUDIES OF TIC AND (TI,V)C STRUCTURES PREPARED BY ACTIVATED REACTIVE EVAPORATION

被引：14

作者：

JACOBSON, BE ^{[1
]}

BUNSHAH, RF ^{[1
]}

NIMMAGADDA, R ^{[1
]}

机构：

[1] UNIV CALIF LOS ANGELES,DEPT MAT,LOS ANGELES,CA 90024

来源：

THIN SOLID FILMS | 1979年 / 63卷 / 02期

关键词：

D O I：

10.1016/0040-6090(79)90040-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Films of TiC and (Ti, V)C solid solutions which had been deposited by the activated reactive evaporation process were annealed in an ultrahigh vacuum transmission electron microscope. Recrystallization of the deposit occured at 1000 °C, with the result that the microstructure transformed from fibrous grain bundles to a structure consisting of equiaxed grains of diameter 100 Å. The grain size was stabilized by an ultrafine network of cavities which were part of the original microstructure deposited at lower temperatures. The presence of a Ti3O phase after annealing at 1000 °C was also observed. © 1979.

引用

页码：357 / 362

页数：6

共 3 条

[1] ACTIVATED REACTIVE EVAPORATION PROCESS FOR HIGH RATE DEPOSITION OF COMPOUNDS
BUNSHAH, RF
RAGHURAM, AC
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (06): : 1385 - &
[2] TRANSMISSION ELECTRON-MICROSCOPY STUDIES OF TIC AND VC-TIC DEPOSITS PREPARED BY ACTIVATED REACTIVE EVAPORATION
JACOBSON, BE
BUNSHAH, RF
NIMMAGADDA, R
[J]. THIN SOLID FILMS, 1978, 54 (01) : 107 - 118
[3] HIGH-RATE THICK-FILM GROWTH
THORNTON, JA
[J]. ANNUAL REVIEW OF MATERIALS SCIENCE, 1977, 7 : 239 - 260

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