INFLUENCE OF THE EXPERIMENTAL CONDITIONS ON THE MORPHOLOGY OF CVD A1N FILMS

被引：36

作者：

ASPAR, B ^{[1
]}

RODRIGUEZ-CLEMENTE, R ^{[1
]}

FIGUERAS, A ^{[1
]}

ARMAS, B ^{[1
]}

COMBESCURE, C ^{[1
]}

机构：

[1] CSIC, INST CIENCIA MAT BARCELONE, E-08193 BARCELONA, SPAIN

来源：

JOURNAL OF CRYSTAL GROWTH | 1993年 / 129卷 / 1-2期

关键词：

D O I：

10.1016/0022-0248(93)90433-W

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

AlN crystalline thick films are obtained by LPCVD using trimethylaluminium and ammonia. A model is proposed to analyse the growth morphologies of these films. The equilibrium morphology of AlN, in a gas-solid system, is derived from the periodic bond chain analysis of the crystal structure and the application of the Bravais-Donnay-Harker law to the crystal lattice and space group. A morphological diagram, showing the habits produced by changing the relative rates of growth of the different crystal forms, has been constructed and used to describe the morphologies obtained in this work and a number of previous references. The influence of the reactant gas flows, the temperature, the total pressure and impurities (mainly hydrogen) on the morphology is analysed.

引用

页码：56 / 66

页数：11

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