FABRICATION OF HIGH PRECISION NOZZLES BY ANISOTROPIC ETCHING OF (100) SILICON

被引：55

作者：

BASSOUS, E

BARAN, EF

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1978年 / 125卷 / 08期

关键词：

D O I：

10.1149/1.2131671

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1321 / 1327

页数：7

共 20 条

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