THE EFFECT OF ARGON DURING THE PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION OF TIN

被引：11

作者：

HILTON, MR

SALMERON, M

SOMORJAI, GA

机构：

[1] UNIV CALIF BERKELEY LAWRENCE BERKELEY LAB,DEPT MAT SCI & MINERAL ENGN,BERKELEY,CA 94720

[2] UNIV CALIF BERKELEY LAWRENCE BERKELEY LAB,DEPT CHEM,BERKELEY,CA 94720

[3] UNIV CALIF BERKELEY LAWRENCE BERKELEY LAB,CTR ADV MAT,BERKELEY,CA 94720

来源：

THIN SOLID FILMS | 1988年 / 167卷 / 1-2期

关键词：

This work was supportedb y the Office of Energy ResearchO; ffice of Basic Energy SciencesM; aterials ScienceD ivision of the U.S. Departmento f Energy; under Contract DE-AC03-76SFOOO98T.h e authors would like to thank G. Rodriguesa ndT. E. Levinef or performings omeo f theA ES measurements;

D O I：

10.1016/0040-6090(88)90516-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

17

引用

收藏

页码：L31 / L34

页数：4

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