VISIBLE-LASER PHOTOCHEMICAL ETCHING OF CR, MO, AND W

[1] LASER-DIRECT-WRITING PROCESSES - METAL-DEPOSITION, ETCHING, AND APPLICATIONS TO MICROCIRCUITS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01): : 419 - 422

[2] MULTIPLE PHOTON EXCITED SF6 INTERACTION WITH SILICON SURFACES [J]. JOURNAL OF CHEMICAL PHYSICS, 1981, 74 (02) : 1453 - 1460

[3] DITTMER G, 1981, PHILIPS J RES, V36, P89

[4] DOLAT VS, IN PRESS

[5] LASER CHEMICAL TECHNIQUE FOR RAPID DIRECT WRITING OF SURFACE RELIEF IN SILICON [J]. APPLIED PHYSICS LETTERS, 1981, 38 (12) : 1018 - 1020

[6] EHRLICH DJ, 1983, J VAC SCI TECHNOL B, V1, P969, DOI 10.1116/1.582718

[7] NON-THERMAL EFFECTS IN LASER-ENHANCED ETCHING OF SILICON BY XEF2 [J]. CHEMICAL PHYSICS LETTERS, 1983, 95 (01) : 5 - 8

[8] EXCIMER LASER ETCHING OF AL METAL-FILMS IN CHLORINE ENVIRONMENTS [J]. APPLIED PHYSICS LETTERS, 1985, 46 (10) : 1006 - 1008

[9] MADER H, 1984, SEMICONDUCTORS TECHN, V5, pC17

[10] MCPHEELY FR, 1985, J VAC SCI TECHNOL A, V3, P879

[1] LASER-DIRECT-WRITING PROCESSES - METAL-DEPOSITION, ETCHING, AND APPLICATIONS TO MICROCIRCUITS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01): : 419 - 422

[2] MULTIPLE PHOTON EXCITED SF6 INTERACTION WITH SILICON SURFACES [J]. JOURNAL OF CHEMICAL PHYSICS, 1981, 74 (02) : 1453 - 1460

[3] DITTMER G, 1981, PHILIPS J RES, V36, P89

[4] DOLAT VS, IN PRESS

[5] LASER CHEMICAL TECHNIQUE FOR RAPID DIRECT WRITING OF SURFACE RELIEF IN SILICON [J]. APPLIED PHYSICS LETTERS, 1981, 38 (12) : 1018 - 1020

[6] EHRLICH DJ, 1983, J VAC SCI TECHNOL B, V1, P969, DOI 10.1116/1.582718

[7] NON-THERMAL EFFECTS IN LASER-ENHANCED ETCHING OF SILICON BY XEF2 [J]. CHEMICAL PHYSICS LETTERS, 1983, 95 (01) : 5 - 8

[8] EXCIMER LASER ETCHING OF AL METAL-FILMS IN CHLORINE ENVIRONMENTS [J]. APPLIED PHYSICS LETTERS, 1985, 46 (10) : 1006 - 1008

[9] MADER H, 1984, SEMICONDUCTORS TECHN, V5, pC17

[10] MCPHEELY FR, 1985, J VAC SCI TECHNOL A, V3, P879