PHOTOELECTRON INJECTION AT METAL-SEMICONDUCTOR INTERFACES

被引：15

作者：

KAO, CW ^{[1
]}

ANDERSON, CL ^{[1
]}

CROWELL, CR ^{[1
]}

机构：

[1] UNIV SO CALIF,DEPT MAT SCI,LOS ANGELES,CA 90007

来源：

SURFACE SCIENCE | 1980年 / 95卷 / 01期

关键词：

D O I：

10.1016/0039-6028(80)90145-4

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：321 / 339

页数：19

共 18 条

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ANDERSON, CL ;

CROWELL, CR ;

KAO, TW .

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[2]

ANDERSON CL, 1976, REV SCI I, V48, P1366

[3]

ANDERSON CL, 1973, THESIS U SO CALIFORN

[4] PHOTOINJECTION INTO SIO2 - ELECTRON SCATTERING IN IMAGE FORCE POTENTIAL WELL [J].

BERGLUND, CN ;

POWELL, RJ .

JOURNAL OF APPLIED PHYSICS, 1971, 42 (02) :573-+

[5] TEMPERATURE DEPENDENCE OF AVALANCHE MULTIPLICATION IN SEMICONDUCTORS [J].

CROWELL, CR ;

SZE, SM .

APPLIED PHYSICS LETTERS, 1966, 9 (06) :242-&

[6] ATTENUATION LENGTH MEASUREMENTS OF HOT ELECTRONS IN METAL FILMS [J].

CROWELL, CR ;

HOWARTH, LE ;

SPITZER, WG ;

LABATE, EE .

PHYSICAL REVIEW, 1962, 127 (06) :2006-&

[7] RANGE OF PHOTOEXCITED HOLES IN AU [J].

CROWELL, CR ;

SPITZER, WG ;

WHITE, HG .

APPLIED PHYSICS LETTERS, 1962, 1 (01) :3-5

[8] ELECTRON-OPTICAL-PHONON SCATTERING IN EMITTER AND COLLECTOR BARRIERS OF SEMICONDUCTOR-METAL-SEMICONDUCTOR STRUCTURES [J].

CROWELL, CR ;

SZE, SM .

SOLID-STATE ELECTRONICS, 1965, 8 (12) :979-&

[9] The analysis of photoelectric sensitivity curves for clean metals at various temperatures [J].

Fowler, RH .

PHYSICAL REVIEW, 1931, 38 (01) :45-56

[10]

KAO CY, UNPUBLISHED

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