A COMPREHENSIVE ANALYTICAL MODEL FOR METAL-INSULATOR SEMICONDUCTOR (MIS) DEVICES

被引:46
作者
DOGHISH, MY
HO, FD
机构
[1] Department of Electrical and Computer Engineering, The University of Alabama in Huntsville, Huntsville
关键词
D O I
10.1109/16.168723
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A comprehensive model for MIS (Metal-Insulator-Semiconductor) devices under dark conditions has been developed which consists of a wide range of parameters. The parameters neglected by other authors have been included. The effects of surface states, silicon dioxide thickness, substrate doping, fixed oxide charges, substrate thickness, and metal work function are all taken into account. The permittivity and barrier height of thin oxide are included in the calculation. The limits on equilibrium and nonequilibrium are explored.
引用
收藏
页码:2771 / 2780
页数:10
相关论文
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