EFFECTS OF HEAT-TREATMENT ON INTERFACE CHARACTERISTICS IN SI-AL2O3 AND SI-SIO2-AL2O3 SYSTEMS

被引：5

作者：

IIDA, K

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1972年 / 11卷 / 03期

关键词：

D O I：

10.1143/JJAP.11.288

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：288 / +

页数：1

共 24 条

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[7] EFFECT OF HEAT TREATMENT ON INTERFACE CHARACTERISTICS IN REACTIVELY SPUTTERED AL2O3-SI STRUCTURES [J].

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