EXTRACTION OF THE MINORITY-CARRIER RECOMBINATION LIFETIME FROM FORWARD DIODE CHARACTERISTICS

被引:48
作者
VANHELLEMONT, J
SIMOEN, E
CLAEYS, C
机构
[1] IMEC, B-3001 Leuven
关键词
D O I
10.1063/1.113465
中图分类号
O59 [应用物理学];
学科分类号
摘要
A simple procedure is proposed to calculate the minority carrier recombination lifetime from forward diode I/V characteristics. By using diodes with strongly different perimeter to area ratio and by taking into account the diode ideality, more accurate lifetime values are obtained. The thus obtained values are in excellent agreement with the ones obtained from microwave absorption measurements of photoconductive decay as is illustrated on Czochralski substrates with different oxygen densities and pretreatments.© 1995 American Institute of Physics.
引用
收藏
页码:2894 / 2896
页数:3
相关论文
共 6 条
[1]   OXYGEN PRECIPITATION EFFECTS ON SI-N+-P JUNCTION LEAKAGE BEHAVIOR [J].
CHAKRAVARTI, SN ;
GARBARINO, PL ;
MURTY, K .
APPLIED PHYSICS LETTERS, 1982, 40 (07) :581-583
[2]   SEPARATION AND ANALYSIS OF DIFFUSION AND GENERATION COMPONENTS OF PN JUNCTION LEAKAGE CURRENT IN VARIOUS SILICON-WAFERS [J].
MURAKAMI, Y ;
SHINGYOUJI, T .
JOURNAL OF APPLIED PHYSICS, 1994, 75 (07) :3548-3552
[3]  
SCHRODER DK, 1990, SEMICONDUCTOR MATERI
[4]   IMPACT OF SILICON SUBSTRATES ON LEAKAGE CURRENTS [J].
SLOTBOOM, JW ;
THEUNISSEN, MJJ ;
DEKOCK, AJR .
IEEE ELECTRON DEVICE LETTERS, 1983, 4 (11) :403-406
[5]   IMPACT OF OXYGEN RELATED EXTENDED DEFECTS ON SILICON DIODE CHARACTERISTICS [J].
VANHELLEMONT, J ;
SIMOEN, E ;
KANIAVA, A ;
LIBEZNY, M ;
CLAEYS, C .
JOURNAL OF APPLIED PHYSICS, 1995, 77 (11) :5669-5676
[6]  
VANHELLEMONT J, 1994, ELECTROCHEM SOC P, P670