SHEET RESISTANCE VARIATION ON COLOR-BANDED SILICON FOLLOWING HIGH DOSE IMPLANTATIONS AT HIGH DOSE-RATES

被引：6

作者：

BEANLAND, DG ^{[1
]}

CHIVERS, DJ ^{[1
]}

机构：

[1] AERE,DIV CHEM,HARWELL OX11 0RA,OXFORDSHIRE,ENGLAND

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1978年 / 15卷 / 04期

关键词：

D O I：

10.1116/1.569783

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1536 / 1540

页数：5

共 26 条

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