EPITAXIAL-GROWTH OF SINGLE-CRYSTAL CA1-XSRXCUO2 THIN-FILMS BY PULSED-LASER DEPOSITION

被引:61
作者
NORTON, DP
CHAKOUMAKOS, BC
BUDAI, JD
LOWNDES, DH
机构
[1] Solid State Division, Oak Ridge National Laboratory, Oak Ridge
关键词
D O I
10.1063/1.109574
中图分类号
O59 [应用物理学];
学科分类号
摘要
Single-crystal thin films of Ca1-xSrxCuO2, the ''infinite layer'' parent compound for the high temperature superconductors, have been grown by pulsed-laser deposition over the composition range 0.15 less-than-or-equal-to x less-than-or-equal-to 1.0 utilizing a single-target codeposition growth scheme. Four-circle x-ray diffractometry reveals that these Ca1-xSrxCuO2 thin films are very high-quality single crystals of the tetragonal, infinite layer phase with extremely narrow diffraction peaks, complete in-plane crystalline alignment with the (100) SrTiO3 substrate, and virtually no impurity phases present. A systematic expansion of the c-axis lattice constant is observed as the Sr content is increased. Four-point transport measurements show that these single-crystal Ca1-xSrxCuO2 films are semiconducting, with room temperature resistivities on the order of an ohm-cm. These results demonstrate that this metastable compound can be epitaxially stabilized over a wide range of composition.
引用
收藏
页码:1679 / 1681
页数:3
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