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SURFACE-ROUGHNESS REDUCTION IN ATOMIC LAYER EPITAXY GROWTH OF TITANIUM-DIOXIDE THIN-FILMS

被引：49
作者：
RITALA, M
LESKELA, M
NIINISTO, L
PROHASKA, T
FRIEDBACHER, G
GRASSERBAUER, M
机构：
[1] HELSINKI UNIV TECHNOL,INORGAN & ANALYT CHEM LAB,SF-02150 ESPOO,FINLAND
[2] VIENNA TECH UNIV,INST ANALYT CHEM,A-1060 VIENNA,AUSTRIA
来源：
THIN SOLID FILMS | 1994年 / 249卷 / 02期
关键词：
Atomic force microscopy - Atomic layer epitaxy - Surface roughness reduction - X ray diffraction;
D O I：
10.1016/0040-6090(94)90754-4
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The surface smoothness of TiO2 films grown by atomic layer epitaxy was improved by incorporating thin intermediate Al2O3 layers into them. The elimination of light scattering from the film surface caused a marked increase in the specular transmittance. Optical measurements, atomic force microscopy, scanning electron microscopy and X-ray diffraction were used in examining the relationships between the amount of Al2O3 added and the optical, morphological and structural properties of the films. The mechanism of the surface roughness reduction is discussed.
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页码：155 / 162
页数：8
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