DIFFUSION OF CU INTO RF-SPUTTERED IRON-OXIDE FILMS

被引：3

作者：

ISHII, O

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 63卷 / 09期

关键词：

D O I：

10.1063/1.340109

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4753 / 4755

页数：3

共 8 条

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[5] SIGNAL-TO-NOISE RATIO STUDIES ON GAMMA-FE2O3 THIN-FILM RECORDING DISKS [J].

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ISHII, O ;

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[6]

TERADO A, 1981, T IECE JAPAN C, V64, P875

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[8] HIGH-DENSITY RECORDING CHARACTERISTICS OF SPUTTERED GAMMA-FE2O3 THIN-FILM DISKS [J].

YOSHII, S ;

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