TEMPERATURE OF AMORPHOUS CHALCOGENIDE FILMS DURING GROWTH BY PHYSICAL VAPOR-DEPOSITION

被引：4

作者：

THORNBUR.DD

机构：

来源：

THIN SOLID FILMS | 1972年 / 11卷 / 02期

关键词：

D O I：

10.1016/0040-6090(72)90047-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

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页码：219 / &

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