DEPOSITION OF SILICON-OXIDE, NITRIDE AND OXYNITRIDE THIN-FILMS BY REMOTE PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION

被引：15

作者：

LUCOVSKY, G

TSU, DV

机构：

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1987年 / 90卷 / 1-3期

关键词：

D O I：

10.1016/S0022-3093(87)80424-6

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：259 / 266

页数：8

共 17 条

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[8] DEPOSITION OF SILICON DIOXIDE AND SILICON-NITRIDE BY REMOTE PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION [J].

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RICHARD, PD ;

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[9] OXYGEN-BONDING ENVIRONMENTS IN GLOW-DISCHARGE DEPOSITED AMORPHOUS SILICON-HYDROGEN ALLOY-FILMS [J].

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