INITIAL NUCLEATION OF A-SI-H - AN INSITU ELLIPSOMETRY STUDY OF THE EFFECT OF DEPOSITION PROCEDURE

被引：22

作者：

COLLINS, RW

CAVESE, JM

机构：

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1987年 / 97-8卷

关键词：

D O I：

10.1016/0022-3093(87)90064-0

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

收藏

页码：269 / 272

页数：4

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[2] OPTICAL-PROPERTIES OF THIN-FILMS
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[J]. THIN SOLID FILMS, 1982, 89 (03) : 249 - 262
[3] GALLAGHER A, 1986, MATER RES SOC S P, V70, P3
[4] DIFFERENCES BETWEEN DIRECT AND REMOTE PLASMA ENHANCED CVD
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[5] FILM FORMATION MECHANISMS IN THE PLASMA DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON
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[J]. JOURNAL OF APPLIED PHYSICS, 1986, 59 (08) : 2998 - 3001