SCATTERING RATES FOR HOLES NEAR THE VALENCE-BAND EDGE IN SEMICONDUCTORS

被引:72
作者
BRUDEVOLL, T
FJELDLY, TA
BAEK, J
SHUR, MS
机构
[1] UNIV MINNESOTA,MINNESOTA SUPERCOMP INST,MINNEAPOLIS,MN 55415
[2] UNIV MINNESOTA,DEPT ELECT ENGN,MINNEAPOLIS,MN 55455
关键词
D O I
10.1063/1.344524
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this paper, we discuss and compare the rates for dominant scattering mechanisms for holes in semiconductors, including ionized impurity scattering, polar and nonpolar optical-phonon scattering, and inelastic acoustic deformation potential scattering. The scattering rates for these mechanisms have been reviewed for the purpose of finding reliable expressions to be used in Monte Carlo simulation of hole transport in p-type III-V semiconductor devices. In the scarce literature on hole scattering rates, we have found several discrepancies. Here, we present corrected rates for ionized impurity scattering and for scattering by polar optical phonons. In addition, we have derived new expressions for the inelastic acoustic deformation potential scattering rates where we also have included a series expansion for the phonon occupation number, beyond the equipartition approximation.
引用
收藏
页码:7373 / 7382
页数:10
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