EFFECT OF NITROGEN ON ELECTRICAL AND STRUCTURAL-PROPERTIES OF TRIODE-SPUTTERED TANTALUM FILMS

被引：32

作者：

WILLMOTT, DJ ^{[1
]}

机构：

[1] BELL NO RES,OTTAWA,ONTARIO,CANADA

来源：

JOURNAL OF APPLIED PHYSICS | 1972年 / 43卷 / 12期

关键词：

D O I：

10.1063/1.1661039

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

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页码：4865 / 4871

页数：7

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共 25 条

[1] BROWN R, 1967, MEASUREMENT TECHNIQU, P178
[2] PREPARATION STRUCTURE AND PROPERTIES OF SPUTTERED HIGHLY NITRIDED TANTALUM FILMS
COYNE, HJ
TAUBER, RN
[J]. JOURNAL OF APPLIED PHYSICS, 1968, 39 (12) : 5585 - +
[3] FONTBONNE A, 1969, REV INT HAUTES TEMP, V6, P181
[4] GAYDOU FP, 1967, VACUUM, V17, P335
[5] EFFECTS OF NITROGEN METHANE + OXYGEN ON STRUCTURE + ELECTRICAL PROPERTIES OF THIN TANTALUM FILMS
GERSTENBERG, D
CALBICK, CJ
[J]. JOURNAL OF APPLIED PHYSICS, 1964, 35 (02) : 402 - &
[6] GULDNER WG, 1964, P ELECTRON COMPONETS, P9
[7] REACTIVELY SPUTTERED TANTALUM THIN FILM RESISTORS .1. PHYSICAL AND ELECTRICAL PROPERTIES
HARDY, WR
SHEWCHUN, J
KUENZIG, D
TAM, C
[J]. THIN SOLID FILMS, 1971, 8 (02) : 81 - &
[8] DEPOSITION OF TANTALUM TANTALUM OXIDE AND TANTALUM NITRIDE WITH CONTROLLED ELECTRICAL CHARACTERISTICS
KRIKORIAN, E
SNEED, RJ
[J]. JOURNAL OF APPLIED PHYSICS, 1966, 37 (10) : 3674 - +
[9] PHASE FORMING PROCESSES IN TANTALUM FILMS THROUGH SPUTTERING
NAKAMURA, M
FUJIMORI, M
NISHIMURA, Y
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1970, 9 (05) : 557 - +
[10] PARISI GI, 1967 P EL COMP C, P367