LANGMUIR PROBE STUDIES OF THE GLOW-DISCHARGE IN AN RF SPUTTERING SYSTEM AT VARIOUS FREQUENCIES

被引：3

作者：

NORSTROM, H

机构：

[1] Unit for Plasma Materials Processing, University of Sussex, Falmer, Brighton

来源：

VACUUM | 1979年 / 29卷 / 11-1期

关键词：

D O I：

10.1016/S0042-207X(79)80894-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A Langmuir probe study of the discharge condition in a typical rf sputtering system operating at various frequencies was made. Ionization probability has been found to be related to the discharge frequency. If has been observed that the plasma potential is related to the frequency, tending to more positive values at lower frequencies. The insulating material covering the metal wire in a Langmuir probe was found to affect the discharge characteristics. © 1979 Pergamon Press Ltd.

引用

页码：443 / 445

页数：3

共 8 条

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NORSTROM, H
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