ELECTRON-MICROSCOPE INVESTIGATIONS OF THE GROWTH-MORPHOLOGY OF CADMIUM ARSENIDE FILMS VACUUM-DEPOSITED AT VARIOUS SUBSTRATE TEMPERATURES

被引：17

作者：

JURUSIK, J

ZDANOWICZ, L

机构：

来源：

THIN SOLID FILMS | 1980年 / 67卷 / 02期

关键词：

D O I：

10.1016/0040-6090(80)90461-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：285 / 291

页数：7

共 17 条

[1] LOW-PRESSURE GAS SCATTERING OF ELECTRON-BEAM-EVAPORATED MCRALY ALLOYS [J].

BEALE, HA ;

GROSSKLAUS, W .

THIN SOLID FILMS, 1977, 40 (JAN) :281-289

[2]

KHAN JH, 1973, J APPL PHYS, V44, P1

[3]

KHAN JH, 1970, THIN FILM TECHNOLOGY

[4] EPITAXIAL DEPOSITION OF GERMANIUM BY BOTH SPUTTERING AND EVAPORATION [J].

KRIKORIAN, E ;

SNEED, RJ .

JOURNAL OF APPLIED PHYSICS, 1966, 37 (10) :3665-+

[5] MORPHOLOGY OF ION-PLATED TITANIUM AND ALUMINUM FILMS DEPOSITED AT VARIOUS SUBSTRATE TEMPERATURES [J].

LARDON, M ;

BUHL, R ;

SIGNER, H ;

PULKER, HK ;

MOLL, E .

THIN SOLID FILMS, 1978, 54 (03) :317-322

[6]

Movchan B. A., 1969, Fizika Metallov i Metallovedenie, V28, P653

[7] CROSS-SECTIONAL STRUCTURE OF BI FILMS AND ITS PHENOMENOLOGICAL ANALYSIS [J].

NAMBA, Y ;

MORI, T .

JOURNAL OF APPLIED PHYSICS, 1975, 46 (03) :1159-1164

[8]

PALATNIK LS, 1972, MECHANISM SUBSTRUCTU

[9] INFLUENCE OF SUBSTRATE TEMPERATURE AND DEPOSITION RATE ON STRUCTURE OF THICK SPUTTERED CU COATINGS [J].

THORNTON, JA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (04) :830-835

[10] HIGH-RATE THICK-FILM GROWTH [J].

THORNTON, JA .

ANNUAL REVIEW OF MATERIALS SCIENCE, 1977, 7 :239-260

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